Multiple cell gaps transreflective LCD and fabricating method thereof

ABSTRACT

A LCD having multiple cell gaps and a method producing the same are provided. By stacking various numbers of dielectric layers and/or a photosensitive organic layer with various thicknesses on a display array substrate, various cell gaps for pixels of various colors can be obtained.

This application claims priority to Taiwan Application Serial Number 96132794, filed Sep. 3, 2007, which is herein incorporated by reference.

BACKGROUND

1. Field of Invention

The present invention relates to a liquid crystal display and a method producing the same. More particularly, the present invention relates to a transreflective liquid crystal display and a method producing the same.

2. Description of Related Art

One solution for solving chromatic dispersion problem of conventional transreflective liquid crystal display (LCD) is to use multiple cell gaps LCD comprising bumps with various thicknesses able to adapt wavelengths of three primary colors. Another solution is attaching two compensative films (¼ wavelength and ½ wavelength) respectively to the outer surfaces of the two substrates. However, the solutions are complicated or may reduce LCD brightness.

SUMMARY

Accordingly, a LCD having multiple cell gaps and a method producing the same are provided.

In one embodiment, a first substrate having a first pixel area, a second pixel area, and a third pixel area is provided. A first dielectric layer and a second dielectric layer are formed over the first, the second and the third pixel areas. The second dielectric layer on the second and the third pixel areas is removed, and the first dielectric layer on the third pixel area is then removed. A second substrate and the first substrate are assembled, and first, second and third gaps are formed respectively on the first, the second and the third pixels, and between the first substrate and the second substrate. Liquid crystal is then filled between the first and the second substrates.

In another embodiment, a first substrate having a first pixel area, a second pixel area, and a third pixel area is provided. A photosensitive organic layer is formed on the first substrate and then exposed, wherein the photosensitive organic layer has first, second, and third exposing depths respectively on the first, the second, and the third pixel areas. The photosensitive organic layer is developed to remove the exposed portions thereof. A second substrate is assembled on the first substrate, and first, second and third gaps are formed respectively on the first, the second and the third pixels, and between the first substrate and the second substrate. Liquid crystal is then filled between the first and the second substrates.

In still another embodiment, the methods described above can be combined together to form a LCD having multiple cell gaps.

It is to be understood that both the foregoing general description and the following detailed description are by examples, and are intended to provide further explanation of the invention as claimed.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention can be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows:

FIG. 1A is a cross-sectional diagram showing red (R), green (G) and blue (B) pixel structures of a transreflective LCD according to an embodiment of this invention;

FIGS. 1B-1F are cross-sectional diagrams showing a process of manufacturing a red pixel of a transreflective LCD according to an embodiment of this invention;

FIG. 2A is a cross-sectional diagram showing red (R), green (G) and blue (B) pixel structures of a transreflective LCD according to another embodiment of this invention;

FIGS. 2B-2D are cross-sectional diagrams showing a process of manufacturing a red pixel of a transreflective LCD according to another embodiment of this invention;

FIGS. 3A-3B are cross-sectional diagrams showing a process of manufacturing pixels of a transreflective LCD according to another embodiment of this invention;

FIGS. 4A-4D are cross-sectional diagrams showing a process of manufacturing pixels of a transreflective LCD according to another embodiment of this invention;

FIGS. 5A-5C are diagrams showing transmission percentage of various color light in a transreflective LCD with one, two, or three cell gaps under various applied voltage;

FIG. 6A is a diagram showing transmission rates of various color lights in a transreflective LCD having a single cell gap is a function of cell gap;

FIG. 6B is a diagram showing transmission rates of lights with various wavelengths in a transreflective LCD having three cell gaps;

FIG. 7 is a cross-sectional diagram showing an ECB type transreflective LCD according to an embodiment of this invention; and

FIG. 8 is a diagram showing the chromatic dispersion of the ECB type transreflective LCD in FIG. 7 under various applied voltage.

DETAILED DESCRIPTION

Reference will now be made in detail to the present embodiments of the invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers are used in the drawings and the description to refer to the same or like parts.

According to embodiments of this invention, an LCD having multiple cell gaps is formed by stacking various numbers of dialectic layers and/or photosensitive organic layers with various thicknesses to form various cell gaps on pixels of different colors.

Embodiment 1

FIG. 1A is a cross-sectional diagram showing red (R), green (G) and blue (B) pixel structures of a transreflective LCD according to an embodiment of this invention. Since the wavelengths of red light, green light and blue light are decreased in turn; the height difference between the transparent area 110 a and the reflective area 105 in the red pixel is the largest. In red pixel, the height difference is at least the total thicknesses of the gate dielectric layer 120, the dielectric layer 130, the protective layer 140 and the organic planar layer 150. The height difference between the transparent area 110 b and the reflective area 105 in the green pixel is smaller. In green pixel, the height difference is at least the total thicknesses of the protective layer 140 and the organic planar layer 150. The height difference between the transparent area 110 c and the reflective area 105 in the blue pixel is the smallest. In blue pixel, the height difference is at least the thickness of the organic planar layer 150. The above three height differences are utilized to form three cell gaps G_(B), G_(G) and G_(R) respectively between the red, green, blue pixels of the bottom substrate 100 and the top substrate 102.

The red pixel is taken as an example to illustrate a process of manufacturing a red pixel of a transreflective LCD according to an embodiment of this invention, and the cross-sectional diagrams of this process are shown in FIGS. 1B-1F.

In FIG. 1B, a substrate 100 having at least a reflective area 105 and at least a transparent area 110 a is provided. A patterned semiconductor layer, such as a silicon island 115 made of polysilicon, is formed on the reflective area 105. Next, ions are implanted into two ends of the silicon island 115 to form a source region 115 b, a drain region 115 c and a channel region 115 a therebetween.

In FIG. 1C, a gate dielectric layer 120 and a first metal layer are sequentially formed on the bottom substrate 100. The first metal layer is then patterned to form a gate 125 above the channel region 115 a. According to an embodiment, the thickness of the gate dielectric layer is about 100-1000 Å. A material of the gate 125 can be molybdenum (Mo), for example.

In FIG. 1D, a dielectric layer 130 is formed on the bottom substrate 100. The dielectric layer 130 can be made of a silicon oxide layer having a thickness of about 1000-3000 Å and a silicon nitride layer having a thickness of about 100-500 Å. Next, the dielectric layer 130 and the gate dielectric layer 120 are patterned to form a source opening 130 a, a drain opening 130 b and a first transparent opening 130 c to respectively expose the source region 115 b, the drain region 115 c and the transparent area 110 a on the bottom substrate 100.

In FIG. 1E, a second metal layer is formed on the bottom substrate 100 and in the source opening 130 a, the drain opening 130 b and the first transparent opening 130 c. The second metal layer is then patterned to form source metal 135 a in and surrounding the source opening 130 a and the drain metal 135 b in and surrounding the drain opening 130 b. The second metal layer can be formed by an Al/Ti/Al composite metal layer, for example.

A protective layer 140 is formed on the bottom substrate 100. The protective layer can be a silicon nitride layer having a thickness of about 1000-3000 Å, for example. The protective layer 140 is patterned to form a pixel opening 140 a and a second transparent opening 140 b to respectively expose the drain metal 135 b and the transparent area 110 a.

In FIG. 1F, a transparent electrode 145 is formed over the transparent area 110 a and a portion of the protective layer 140 and in the pixel opening 140 a to electrically connect the drain metal 135 b through the pixel opening 140 a. An organic planar layer 150 and a reflective electrode 155 are sequentially formed on the reflective area 105. The reflective electrode 155 electrically connects the transparent electrode 145 on the border of planar organic layer 150. The thickness of the planar organic layer 150 is about 1-3 μm, for example.

Embodiment 2

FIG. 2A is a cross-sectional diagram showing red (R), green (G) and blue (B) pixel structures of a transreflective LCD according to another embodiment of this invention. Similarly, since the wavelengths of red light, green light and blue light are decreased in turn, the height difference, which is at least the total thicknesses of the gate dielectric layer 220, the protective layer 245 and the planar organic layer 260, between the transparent area 210 a and the reflective area 205 in the red pixel is the largest. Next, the height difference, which is at least the thickness of the planar organic layer 260, between the transparent area 210 b and the reflective area 205 in green and blue pixels is smaller.

The red pixel is taken as an example to illustrate a process of manufacturing a red pixel of a transreflective LCD according to another embodiment of this invention, and the cross-sectional diagrams of this process are shown in FIGS. 2B-2D.

In FIG. 2B, a substrate 200 having at least a reflective area 205 and at least a transparent area 210 a is provided. A gate 215 is formed on the reflective area 205, and a gate dielectric layer 220 is then formed on the substrate 200. A silicon island 225 having a doping surface layer is formed on the gate dielectric layer 220 and above the gate 215. A source metal 230 a and a drain metal 230 b are formed on two sides of the silicon island 225. The exposed doping surface layer is removed to form a channel region 225 a. The two regions on two sides of the channel region 225 a are a source region 225 b and a drain region 225 c, respectively.

In FIG. 2C, a protective layer 245 is formed over the substrate 200 and then patterned to form a pixel opening 250 a and a transparent opening 250 b to respectively expose the drain metal 230 b and the transparent area 210 a.

In FIG. 2D, a transparent electrode is formed on the transparent area 210 a and in the pixel opening 250 a to electrically connect the drain metal 235 b. A planar organic layer 260 and a reflective electrode 265 are sequentially formed on the reflective area 205. The reflective electrode 265 electrically connects the transparent electrode 255 on the border of planar organic layer 260.

Embodiment 3

The transparent electrode, electrically connecting the drain metal, is first formed in embodiments 1 and 2, and the reflective electrode is then formed to electrically connect the transparent electrode. According to other embodiment, the reflective electrode can be first formed to electrically connect the drain metal, and the transparent electrode is then formed to electrically connect the reflective electrode. This invention can also be applied on transmission type LCDs with the reflective electrode replaced by a transparent electrode.

FIGS. 3A-3B are cross-sectional diagrams showing a process of manufacturing pixels of a transreflective LCD according to another embodiment of this invention. Since the processes before FIG. 3A are the same as those shown in FIGS. 1A-1D, the related descriptions are thus omitted, as they need not be duplicatively described. The elements in FIGS. 3A-3D equivalent to those in FIGS. 1A-1D are denoted by adding 200 to the reference numbers of equivalent elements in FIGS. 1A-1D.

In FIG. 3A, which follows FIG. 1D, a protective layer 340 is formed, and a first pixel opening 240 a is formed in the protective layer 340. Next, a photosensitive planar organic layer 350 is formed over the substrate 300.

In FIGS. 3A and 3B, the photosensitive planar organic layer 350 is then exposed by gray tone or multi tone exposing method and developed. The exposing depths of the transparent areas 310 a in red pixel, 310 b in green pixel, and 310 c in blue pixels are a first depth 370, a second depth 380, and a third depth 390, respectively, to produce various height differences between the reflective area 305 and the transparent areas 310 a, 310 b, and 310 c. At the same time, the photosensitive planar organic layer 350 in the pixel opening 340 a is fully exposed to form a second pixel opening 350 a.

In FIG. 3B, a reflective electrode 355 is formed on the reflective area 305 and in the second pixel opening 350 a to electrically connect the drain metal 335 b through the second pixel opening 350 a. Since the residual heights of the photosensitive planar organic layer 350 on the transparent areas 310 a, 310 b, and 310 c are varied, the height differences between the reflective area 305 and the transparent areas 310 a, 310 b, and 310 c are also varied. Then, transparent electrodes 345 are respectively formed on the transparent areas 310 a, 310 b, and 310 c to electrically connect the reflective electrode 355.

Although only a top-gate is demonstrate in the above example, the method described above can also be applied on manufacturing transreflective LCDs having bottom-gate structures.

Embodiment 4

The various combinations of the gate dielectric layer, the dielectric layer, and the protective layer of embodiment 1 can also be combined with the photosensitive planar organic layer with various exposing depths of embodiment 3 to adjust the cell gaps of various color pixels.

FIGS. 4A-4D are cross-sectional diagrams showing a process of manufacturing pixels of a transreflective LCD according to another embodiment of this invention. The elements in FIGS. 4A-4D equivalent to those in FIGS. 1A-1F are denoted by adding 300 to the reference numbers of equivalent elements in FIGS. 1A-1F.

The required process for obtaining the structure in FIG. 4A is roughly the same as the process for obtaining the red pixel structure in FIG. 3B. The only difference is that the gate dielectric layer 420 and the dielectric layer 430 on the transparent area 410 a are not removed when the source opening 430 a and the drain opening 430 b are formed. Therefore, the height difference between the transparent area 410 a and the reflective area 405 is the total thicknesses of the protective layer 440 and the photosensitive planar organic layer 450.

The required process for obtaining the structure in FIG. 4B is roughly the same as the process for obtaining the pixel structure in FIG. 4A. The only difference is the protective layer 440 on the transparent area 410 b is not removed when forming the pixel opening 440 a. Therefore, the height difference between the transparent area 410 b and the reflective area 405 is the thickness of the photosensitive planar organic layer 450.

The required process for obtaining the structure in FIG. 4C is roughly the same as the process for obtaining the pixel structure in FIG. 4A. The only difference is that the gray tone photolithography is used to pattern the photosensitive planar organic layer 450 to leave the photosensitive planar organic layer 450 with a residual thickness on the transparent area 410 c. Therefore, the height difference between the transparent area 410 c and the reflective area 405 is the sum of the thickness of the protective layer 440 and the partial thickness of the photosensitive planar organic layer 450.

The required process for obtaining the structure in FIG. 4D is roughly the same as the process for obtaining the pixel structure in FIG. 4B. The only difference is that the gray tone photolithography is used to pattern the photosensitive planar organic layer 450 to leave the photosensitive planar organic layer 450 with a residual thickness on the transparent area 410 d. Therefore, the height difference between the transparent area 410 d and the reflective area 405 is the partial thickness of the photosensitive planar organic layer 450.

Although only top gate structure is demonstrated in the above example, the bottom gate structure in embodiment 2 can also be combined with the photosensitive planar organic layer with various exposing depths of embodiment 3 to adjust the cell gaps of various color pixels.

The method for producing pixels with various cell gaps can provide a choice for manufacturer to adjust the cell gaps of pixels according to the wavelength of selected color light. Therefore, the problem of chromatic dispersion and blue shift can be solved and transmission rates of various color lights can be increased (please see FIG. 7).

Transmission Rates of Red, Green, and Blue Color Lights

FIGS. 5A-5C are diagrams showing transmission rates of various color lights in a transreflective LCD with one, two, or three cell gaps under various applied voltages. In FIGS. 5A-5C, 450 nm (blue light), 550 nm (green light), and 630 nm (red light) are used to represent transmission rates of various color lights under various applied voltages.

In FIG. 5A, the cell gaps of the three color pixels (R, G, B) are 3.6 μm, and the transmission rate is not very consistent and chromatic dispersion is thus caused. In FIG. 5B, the cell gaps of blue and green pixels are 3.6 μm, and the cell gap of the red pixel is 4 μm. The result shows that the transmission rates of the three color lights are almost the same when the applied voltage is smaller than 1 volt. In FIG. 5C, the cell gaps of the blue, green, and red pixels are 3.35 μm, 3.65 μm, and 4.0 μm, respectively. The results show that the transmission rates of the three color lights are almost the same even when the applied voltage is larger than 1 volt.

FIG. 6A is a diagram showing transmission rates of various color lights in a transreflective LCD having a single cell gap is a function of cell gap. The result shows that it is hard to find a single cell gap to allow three color lights to have high transmission rates.

FIG. 6B is a diagram showing transmission rates of lights with various wavelengths in a transreflective LCD having three cell gaps. In FIG. 6B, the three cell gaps of the transreflecive LCD are 3.6 μm, 4.0 μm, and 4.4 μm. Light in a wavelength of 400-775 μm is used for the transmission test. The result shows that different cell gaps provide different transmission rates to lights with different wavelengths. Therefore, the cell gap of different color pixel can be individually designed to obtain higher transmission rate.

Embodiment 5

Generally, wide view angle LCD is assembled by an LCD of twisted nematic type and two compensate films and polarizers respectively attached on the outer surfaces of the top and bottom substrates. The two compensate films are ¼ λ and ½ λ, respectively, to increase the view angle of the LCD. However, it easily cause chromatic dispersion problem.

However, applying the multiple cell gap structures of the embodiments described above on a transreflective LCD of ECB (electrically controlled birefringence or electrically controlled bend) type, the chromatic dispersion is not increased even when the ½ λ compensate film is removed.

FIG. 7 is a cross-sectional diagram showing an ECB type transreflective LCD according to an embodiment of this invention. In FIG. 7, a top substrate 705 and a bottom substrate 710 are respectively on the top and bottom sides of a liquid crystal layer 700. The optical films on the outer sides of the top substrate 705 are a first compensate film (¼ λ) 715 and a first polarizer 725. The optical films on the outer sides of the bottom substrate 710 are a second compensate film (¼ λ) 720 and a second polarizer 730.

FIG. 8 is a diagram showing the chromatic dispersion of the ECB type transreflective LCD in FIG. 7 under various applied voltages. The cell gaps of the blue, green, and red pixels are 3.6 μm, 4.0 μm, and 4.3 μm, respectively. The result shows that the transmission rates of the blue, green, and red lights are quite consistent when the applied voltage is larger than 1 volt. Therefore, the ECB type transreflective LCD in FIG. 7 can preserve the advantages of both wide view angle and low chromatic dispersion.

It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present invention without departing from the scope or spirit of the invention. In view of the foregoing, it is intended that the present invention cover modifications and variations of this invention provided they fall within the scope of the following claims. 

1. A method of fabricating a multiple cell gaps transreflective LCD, the method comprising: providing a first substrate having a red pixel area, a green pixel area, and a blue pixel area, wherein each of the red, green and blue pixel areas has both a transparent region and a reflective region; forming a first transistor, a second transistor and a third transistor respectively in the red pixel area, the green pixel area and the blue pixel area; sequentially forming a first dielectric layer and a second dielectric layer over the red, the green and the blue pixel areas; removing the second dielectric layer on the red and the green pixel areas; removing the first dielectric layer on the red pixel area; forming at least three transparent electrodes respectively connected to the first transistor, the second transistor and the third transistor; assembling a second substrate and the first substrate to form a first gap, a second gap and a third gap, respectively, at the transparent regions of the red pixel area, the green pixel area and the blue pixel area between the first substrate and the second substrate; and filling liquid crystals between the first and the second substrate.
 2. The method of claim 1, wherein a material of the first dielectric layer comprises silicon oxide.
 3. The method of claim 1, wherein a material of the second dielectric layer comprises silicon nitride.
 4. The method of claim 1, wherein each of the first transistor, the second transistor and the third transistor, respectively, comprises a top gate thin film transistor.
 5. The method of claim 1, wherein each of the first transistor, the second transistor and the third transistor, respectively, comprises a bottom gate thin film transistor.
 6. The method of claim 1, further comprises forming at least three reflective electrodes in the reflective regions of the red pixel area, the green pixel area and the blue pixel area, respectively.
 7. The method of claim 6, wherein a material of the reflective electrode comprises aluminum. 